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會(huì)議報(bào)告 | 晶圓級(jí)微光學(xué)技術(shù)賦能新興應(yīng)用領(lǐng)域的未來

Date Posted:2025-04-23

2025年4月28日(星期一)15:00(北京時(shí)間),炬光科技首席產(chǎn)品官、首席工藝官Q(mào)ichuan Yu參加由蘇州納米城&深圳市微納制造產(chǎn)業(yè)促進(jìn)會(huì)聯(lián)合主辦的2025(第二屆)微納制造技術(shù)應(yīng)用生態(tài)大會(huì)暨頒獎(jiǎng)典禮,并受邀在會(huì)上發(fā)表題為《晶圓級(jí)微光學(xué)技術(shù)賦能新興應(yīng)用領(lǐng)域的未來》的專題演講,演講語言為中文。

 

晶圓級(jí)微納光學(xué)(WLO)精密壓印加工制造技術(shù),可結(jié)合微納光學(xué)設(shè)計(jì)目標(biāo)進(jìn)行母版的設(shè)計(jì)與制造,并在6英寸或8英寸晶圓基板上進(jìn)行高精密壓印、易于擴(kuò)展的晶圓級(jí)工藝,滿足微納光學(xué)元器件的大規(guī)模生產(chǎn)。紫外線固化、低溫、低壓工藝,可針對(duì)微米/納米結(jié)構(gòu)特征進(jìn)行適形再現(xiàn)。晶圓級(jí)堆疊工藝(WLS)技術(shù)使用先進(jìn)的掩膜對(duì)準(zhǔn)設(shè)備對(duì)多個(gè)光學(xué)晶圓與剛性間隔塊進(jìn)行幾微米級(jí)精度堆疊,具備無鏡筒、支架、高度緊湊、高度集成和可回流等特征,更可集成光圈、鍍膜、光譜濾波等附加功能,實(shí)現(xiàn)經(jīng)濟(jì)高效的晶圓級(jí)光學(xué)鏡頭模組。

在此基礎(chǔ)上,晶圓級(jí)透鏡集成(WLI)技術(shù)實(shí)現(xiàn)了微型芯片級(jí)封裝(CSP)傳感器的無縫整合,構(gòu)建出超薄且光密封的可工作模組。這種創(chuàng)新設(shè)計(jì)不僅顯著增強(qiáng)了設(shè)計(jì)的靈活性,還極大優(yōu)化了空間利用率,為高性能、小型化光學(xué)系統(tǒng)的開發(fā)提供了新的方向。

相較于傳統(tǒng)模壓工藝和注塑工藝,該技術(shù)路線具備顯著優(yōu)勢(shì):更低的單件成本、更高的尺寸一致性、更強(qiáng)的系統(tǒng)集成能力。結(jié)合無鏡筒結(jié)構(gòu)、高度集成模組設(shè)計(jì)及可回流封裝能力,晶圓級(jí)光學(xué)系統(tǒng)尤其適用于AR/VR、AI視覺、3D傳感、近紅外成像等對(duì)體積、功耗和制造成本高度敏感的應(yīng)用場(chǎng)景。

炬光科技以晶圓級(jí)光學(xué)為基礎(chǔ),構(gòu)建包括成像鏡組、濾光元件、光圈和黑化側(cè)壁在內(nèi)的整體模組解決方案,用于新興消費(fèi)電子領(lǐng)域應(yīng)用場(chǎng)景。通過芯片級(jí)封裝和表面貼裝兼容性,這類模組不僅支持大規(guī)模標(biāo)準(zhǔn)化生產(chǎn),也顯著簡(jiǎn)化終端系統(tǒng)的光機(jī)集成難度。公司自有的開發(fā)與制造平臺(tái),實(shí)現(xiàn)從設(shè)計(jì)、仿真、母版制作、量產(chǎn)制造、到光學(xué)檢測(cè)和最終檢測(cè)的完整鏈條,確保高效率、低成本、高質(zhì)量地交付各類標(biāo)準(zhǔn)化、定制化解決方案。

作為一站式產(chǎn)品與服務(wù)解決方案的提供商,炬光科技將持續(xù)推動(dòng)技術(shù)創(chuàng)新,滿足消費(fèi)電子市場(chǎng)對(duì)高性能、小型化光學(xué)解決方案的迫切需求,引領(lǐng)全球光子行業(yè)的未來發(fā)展。

 

演講人信息

Qichuan Yu,炬光科技首席產(chǎn)品官、首席工藝官。他在晶圓級(jí)光學(xué)元器件、光學(xué)傳感器和相機(jī)封裝、SAW/BAW濾波器研發(fā)領(lǐng)域擁有超過25年經(jīng)驗(yàn),尤其擅長(zhǎng)母版制作、工作模具和晶圓級(jí)微光學(xué)元件制造及微型攝像模組、光學(xué)傳感器集成封裝。

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